EVANANO TECH CO., LTD

奈極儀器有限公司
 
   
 
 
PRODUCTS
 產品資訊
　 Stage Machine
　 System Introduction
   
 
   
 
　 Technical Parameters  
   
 
　Exposure area (XY itinerary) 　≧ 30 X 30 mm
　Stage Positioning Accuracy 　80 nm
　Table Accuracy 　20 nm
　Sample Size 　≧ 1-inch chip
　Scan size 　Reached 100 um or greater, the market size can be digitally optional
　Stitching Accuracy 　≦ 140 nm
　Alignment precision 　≦ 140 nm
   
 
　　Through the use of the Scanning Electron Microscopy and pairing it with Stage Machine, it can be used for Electron Beam Lithography, Ion Beam Lithography and Optical Lithography, which allows for a great number of uses.
  EVANANO TECH CO.,LTD 奈極儀器有限公司  
COPYRIGHTS ©2008 EVANANO TECH CO.,LTD 奈極儀器有限公司
  
 
TEL(FAX)：05-5981990， Mail：ent@evananotech.com